W&L NCS 3-150 Microwave Plasma CVD System

Low Temperature CVD Systems

Ideal for substrates requiring lower temp deposition

• Microwave plasma linear antenna systems
• Low-temperature poly diamond deposition (<400°C)
• For glass, polymers and other substrates requiring lower temps
• Scalable for large substrates and moving web: 1 meter wide by multiple meter depth
• Small system available for R&D (<8” diameter)